Rapid, General-Purpose Patterning of Silicon Nitride Thin Films Under Ambient Conditions for Applications Including Fluid Channel and SERS Substrate Formation

Sheetz, B.S., Nuwan D.Y. Bandara, Y.M., Rickson, B., Auten, M. & Dwyer, J.R. (2020). ACS Appl. Nano Mater., https://doi.org/10.1021/acsanm.0c00248. (LINK)